Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
In: Semiconductor physics, quantum electronics and optoelectronics, Jg. 10 (2007-10-19), S. 76-80
Online
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Zugriff:
The systems "thin Ni film - lithium niobate" and "thin Pd film - lithium tantalate" are implanted by Ar + ions with an energy of 100 keV and a dose of 10 16 cm -2 . Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in a change of its optical, electrical, and mechanical properties. Strong difference in the near-surface structures between implanted systems with Ni or Pd thin films is observed. Such a difference is explained by the heterogeneity of an ion beam and different properties of the materials. The application to the development of high-sensitive pyroelectric detectors with high damage threshold is proposed.
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Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
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Autor/in / Beteiligte Person: | Lysiuk, V. O. ; Lashkaryov, V. |
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Zeitschrift: | Semiconductor physics, quantum electronics and optoelectronics, Jg. 10 (2007-10-19), S. 76-80 |
Veröffentlichung: | National Academy of Sciences of Ukraine (Co. LTD Ukrinformnauka), 2007 |
Medientyp: | unknown |
ISSN: | 1605-6582 (print) ; 1560-8034 (print) |
DOI: | 10.15407/spqeo10.02.076 |
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