Significant k-point selection scheme for computationally efficient band structure based UTB device simulations
In: Semiconductor Science and Technology, Jg. 36 (2021-10-08), S. 115009-115009
Online
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Zugriff:
The accurate calculation of channel electrostatics parameters in ultra-thin body devices requires self-consistent solution of the Poisson's equation and the full-band structure of the thin channel. For silicon channel, the full-band structure is obtained using the semi-empirical sp3d5s* tight-binding model. To make this approach computationally tractable for a wide range of channel thicknesses, in terms of time and resource, only significant k-points in the irreducible Brillouin zone need to be considered. In this work, we present a scheme for precisely identifying the significant k-points based on Fermi-Dirac probability and show that the band-structure approach using those significant k-points can be applied over a wide range of channel thicknesses, oxide thicknesses, device temperatures and different channel orientations. The benchmarking of the obtained channel electrostatics parameters is performed with the results from accurate full-band structure simulations showing excellent agreement (maximum error within 0.5%) along with significant reduction in computational time.
Titel: |
Significant k-point selection scheme for computationally efficient band structure based UTB device simulations
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Autor/in / Beteiligte Person: | Nalin Vilochan Mishra ; Solanki, Ravi ; Aditya Sankar Medury |
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Zeitschrift: | Semiconductor Science and Technology, Jg. 36 (2021-10-08), S. 115009-115009 |
Veröffentlichung: | IOP Publishing, 2021 |
Medientyp: | unknown |
ISSN: | 1361-6641 (print) ; 0268-1242 (print) |
DOI: | 10.1088/1361-6641/ac256e |
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