7330 The impact of high-k dielectrics on the performance of Schottky barrier source/drain (SBSD) ultra-thin body (UTB) SOI MOSFET
In: ACTA PHYSICA SINICA -CHINESE EDITION-, Jg. 57 (2008), Heft 7, S. 4481-4485
serialPeriodical
Zugriff:
Titel: |
7330 The impact of high-k dielectrics on the performance of Schottky barrier source/drain (SBSD) ultra-thin body (UTB) SOI MOSFET
|
---|---|
Autor/in / Beteiligte Person: | Su-Zhen, L. ; Hong-Xia, L. ; Ren-Xu, J. ; Nai-Qiong, C. ; Jin, W. |
Link: | |
Zeitschrift: | ACTA PHYSICA SINICA -CHINESE EDITION-, Jg. 57 (2008), Heft 7, S. 4481-4485 |
Veröffentlichung: | 2008 |
Medientyp: | serialPeriodical |
ISSN: | 1000-3290 (print) |
Sonstiges: |
|