Anisotropically etched Si surface and the electrical properties of Si/HgCdTe heterostructures
In: Proceedings of Symposium J on Growth and Evolution of Ultra Thin Films: Surface and Interface Geometric & Electronic Structure, of the E-MRS 2002 Spring Conference, Strasbourg, France, June 18-21, 2002Thin solid films 428(1-2):165-169; Jg. 428 (2003) 1-2, S. 165-169
Online
Konferenz
- print, 22 ref
We used (001)-oriented silicon wafers, chemically etched under special conditions, as substrates for laser epitaxy of HgCdTe. Three types of Si surface with different microrelief were obtained: flat, pyramid-like and plate-like. Thin films of HgCdTe were deposited using a YAG:Nd3+ laser. The electrical properties of the structures under investigation were analysed on the basis of current-voltage characteristics. These characteristics are interpreted in relation to the structural properties of the Si substrate surface. The carrier transport mechanisms for different HgCdTe/Si interfaces are presented.
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Anisotropically etched Si surface and the electrical properties of Si/HgCdTe heterostructures
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Autor/in / Beteiligte Person: | GORBACH, T. Ya ; KUZMA, M ; SMERTENKO, P. S ; SVECHNIKOV, S. V ; WISZ, G |
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Quelle: | Proceedings of Symposium J on Growth and Evolution of Ultra Thin Films: Surface and Interface Geometric & Electronic Structure, of the E-MRS 2002 Spring Conference, Strasbourg, France, June 18-21, 2002Thin solid films 428(1-2):165-169; Jg. 428 (2003) 1-2, S. 165-169 |
Veröffentlichung: | Lausanne: Elsevier Science, 2003 |
Medientyp: | Konferenz |
Umfang: | print, 22 ref |
ISSN: | 0040-6090 (print) |
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