Electrodeposition of microlayered copper coatings by programmable pulsed current
In: Russian journal of electrochemistry, Jg. 32 (1996), Heft 5, S. 547-551
academicJournal
- print, 24 ref
Zugriff:
The pulsed programmable electrodeposition of microlayered single-metal copper coatings (microlayers 3 μm thickness) in a single electrolyzer from a sulfate electrolyte is studied. The procedure is given for selecting the effective parameters of the programmable current. The specific features of the structure and behavior of lamellar deposits are reported.
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Electrodeposition of microlayered copper coatings by programmable pulsed current
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Autor/in / Beteiligte Person: | KOSTIN, N. A ; LABYAK, O. V |
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Zeitschrift: | Russian journal of electrochemistry, Jg. 32 (1996), Heft 5, S. 547-551 |
Veröffentlichung: | Birmingham, AL; Moscow: Interperiodica, 1996 |
Medientyp: | academicJournal |
Umfang: | print, 24 ref |
ISSN: | 1023-1935 (print) |
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