High quality UTB GeOI by HEtero-Layer-Lift-Off (HELLO) technology for future Ge CMOS application
2018
Online
academicJournal
Zugriff:
Titel: |
High quality UTB GeOI by HEtero-Layer-Lift-Off (HELLO) technology for future Ge CMOS application
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Autor/in / Beteiligte Person: | Takagi, Hideki ; Hattori, Hiroyuki ; Ishii, Hiroyuki ; Ota, Hiroyuki ; Uchida, Noriyuki ; Maeda, Tatsuro ; Irisawa, Toshifumi ; Wen Hsin Chang ; Kurashima, Yuichi |
Link: | |
Veröffentlichung: | 2018 |
Medientyp: | academicJournal |
ISSN: | 2436-7613 (print) |
DOI: | 10.11470/jsapmeeting.2018.1.0_288 |
Sonstiges: |
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